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Photolithographic Multispectral Filter

The photolithographic multispectral filter is precisely fabricated using a combined photolithography and coating process, with multiple spectral channels integrated at different spatial locations on a single substrate. Each channel boasts exceptionally high spatial alignment accuracy while maintaining excellent spectral characteristics.

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  • Product Description
  • Parameter Introduction
  • Precautions
  • Product Performance

    Type

    Photolithographic Multispectral Filter

    Center wavelength

    450-850nm

    Half-peak bandwidth

    50-400nm

    Peak transmittance

    ≥92% (customizable upon request)

    Product dimensions

    20–81 mm (customizable upon request)

    Cutoff wavelength

    300-1100nm

    Depth limit

    ≥OD3

    Graphic dimension accuracy

    ±5 μm

    Black mask area

    R < 3%

    Product material

    Optical-grade sapphire

    Surface finish

    10-5

    Center Wavelength (nm)

    Half-peak bandwidth (nm)

    Roughness (nm)

    Depth limit

    Average transmittance (%)

    475 ± 10

    90 ± 20

    15

    OD≥3 @ 300–1100 nm

    T≥92

    560 ± 10

    80 ± 20

    15

    OD≥3 @ 300–1100 nm

    T≥92

    625 ± 10

    350 ± 20

    20

    OD≥3 @ 300–1100 nm

    T≥92

    660 ± 10

    60 ± 20

    15

    OD≥3 @ 300–1100 nm

    T≥92

    830 ± 10

    120 ± 20

    25

    OD≥3 @ 300–1100 nm

    T≥92

    Spectral curve

     

    Application areas

    1. Space Remote Sensing
    2. Imaging spectrometer
    3. Medical Multispectral Imaging

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